2012 | JOURNAL OF APPLIED PHYSICS |
Fabrication of single-walled carbon nanohorns containing iodine and cesium
| 41139 |
2011 | 전기전자재료학회논문지 |
플라즈마 삽입전극의 전류에 미치는 밀도 구배의 영향
| 2772 |
2011 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge
| 7399 |
2010 | Carbon |
Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment
| 6820 |
2010 | Thin Solid Films |
Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition
| 8222 |
2009 | Journal of Applied Physics |
Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge
| 5747 |
2009 | Journal of the Korean Physical Society |
A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma
| 6004 |
2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6389 |
2009 | Journal of Korean Physical Society |
Effect of Bias Frequency on the Accuracy of Floating Probe Measurements
| 8539 |
2009 | Journal of Korean Physical Society |
Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge
| 10078 |
2008 | Review of Scientific Instruments |
Self-consistent circuit model for plasma source ion implantation
| 6104 |
2007 | Physics of Plasmas |
Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation
| 5176 |
2006 | Japanese Journal of Applied Physics |
Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions
| 4305 |
2006 | Japanese Journal of Applied Physics |
Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma
| 4536 |
2006 | Journal Of The Korean Physical Society |
Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
| 5697 |