연도 2016 
저널명 반도체디스플레이기술학회지 
 
Abstract: The Townsend to glow discharge mode transition was investigated in the dielectric barrier discharge (DBD) helium
plasma source which was powered by 20 kHz / 4.5 kVrms high voltage at atmospheric pressure. The spatial profile of
the electric field strength at each modes was measured by using the intensity ratio method of two helium emission lines
(667.8 nm (31D → 21P) and 728.1 nm (31S → 21P)) and the Stark effect. ICCD images were analyzed with consideration
for the electric field property. The Townsend discharge (TD) mode at the initial stage of breakdown has the light emission
region located in the vicinity of the anode. The electric field of the light emitting region is close to the applied field in
the system. Immediately, the light emitting region moves to the cathode and the discharge transits to the glow discharge
(GD) mode. This mode transition can be understood with the ionization wave propagation. The electric field of the emitting
region of GD near cathode is higher than that of TD near anode because of the cathode fall formation. This observation
may apply to designing a DBD process system and to analysis of the process treatment results.
연도 저널명 제목 조회 수
2001  Japanese journal of applied physics  Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate 5020
2001  Journal of applied physics  Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma 5837
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7091
2001  Surface & Coating Technology  Measurement of sheath expansion in plasma source ion implantation 9862
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16458
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 83694
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4912
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5358
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6069
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7331
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4702
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8641
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7706
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6990
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5398

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