연도 2016 
저널명 Journal of the Korean Physical Society 
 

Abstract


The type of induced material damage in the tungsten irradiated by using deuterium ions was investigated for various value of the fluence at low energy. Experiments were carried out in an electron cyclotron resonance (ECR) plasma source that provided an ion flux of 2.8 × 1021 D+2 /m2s and a sheath energy of 100 eV/D+ 2 on the tungsten target. The energy of irradiated ions was much smaller than the threshold energy for generating cascade collisional damage (∼ 250 eV) in tungsten and was similar of the plasma at the first wall of KSTAR. The target temperature was kept as 700 − 800 K by using an active cooling system. Secondary ion mass spectroscopy (SIMS) was employed to observe the depth profiles of deuterium. The peak of the trapped deuterium concentration in the irradiated tungsten was located near 16 − 17 nm for 2.0 − 4.0 × 1025 D2/m2, which is far deeper than the 1.6 nm for ion implantation at 100 eV/D+ 2 ions. Thermal desorption spectroscopy (TDS) data were analyzed to determine the binding energy (Eb = 1.45 eV) of trapped deuterium, which corresponded to an oversaturation-induced vacancy. This observation is very important for understanding the refueling property of the retained deuterium during steady-state fusion plasma operation.


DOI: 10.3938/jkps.69.518


https://link.springer.com/article/10.3938/jkps.69.518

연도 저널명 제목 조회 수
2024  Current Applied Physics  Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate 37
2022  Current Applied Physics  Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma 261
2022  Plasma Sources Science and Technology  Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma file 339
2022  Journal of Alloys and Compounds  Competitive roles of dislocations on blister formation in polycrystalline pure tungsten file 431
2022  Journal of the Korean Physical Society  Plasma Information-based virtual metrology (PI-VM) and mass production process control file 638
2022  Physics of Plasma  2022 Review of Data-Driven Plasma Science file 798
2021  Journal of the Korean Physical Society  Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 321
2021  Current Applied Physics  Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate 441
2021  Atoms  Population Kinetics Modeling of Low-Temperature Argon Plasma 644
2021  반도체디스플레이기술학회지  VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석 790
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1656
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3787
2019  IAEA CRP report  Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling 600
2019  Current Applied Physics  Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth 624
2019  Scientific Reports  Quantitation of the ROS production in plasma and radiation treatments of biotargets 933

Archives


XE Login