Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing
2019.07.24 10:50
| 연도 | 2019 |
|---|---|
| 저널명 | Plasma Physics and Controlled Fusion |
| 쪽 | - |
Plasma Phys. Control. Fusion
Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing
주저자: Seolhye Park
S. Park, Plasma Phy. Control. Fusion 61 (2019) 014032 (9pp)
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