| 연도 | 저널명 | 제목 | 조회 수 |
|---|---|---|---|
| 1993 | Journal of Vacuum Science & Technology | Role of contaminants in electron cyclotron resonance plasmas | 5385 |
| 1992 | IEEE Transactions On Plasma Science | Double Layer-Relevant Laboratory Results | 3780 |
| 1992 | Plasma Sources Science & Technology | Measurements of the presheath in an electron cyclotron resonance etching device | 4630 |