| 연도 | 1992 |
|---|---|
| 저널명 | Plasma Sources Science & Technology |
| 쪽 |
The first direct measurement of a collisional Bohm presheath from plasma potential measurements is given. By measuring the presheath thickness in front of a grounded wafer stage, a determination of the collision mean free path for ions in an electron cyclotron resonance etching tool has been made. Presheaths were measured in N2, and CF4, plasma using an emissive probe. The presheath thickness in N2, was found to be linearly dependent on the mean free path. Measurements of CF4, plasmas, for which the collision cross sections are unknown, have shown results similar to those found for nitrogen. This result has enabled an extrapolation to be made of the effective cross section for collisions in plasmas created from CF4.