Publications
2019 IAEA CRP report-ATOMIC AND PLASMA-MATERIAL INTERACTION DATA FOR FUSION Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling
2019 Current Applied Physics Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
2019 Plasma Physics and Controlled Fusion Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing
2019 Plasma Processes and Polymers Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing
2018 IEEE Transactions on Semiconductor Manufacturing Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables

Phone: +82-2-880-8971 Fax: +82-2-889-2688 Webmaster: swryus@snu.ac.kr

Plasma Application Laboratory, building 30, room 102, 599 Gwanangno, Gwanak-gu, Seoul, 151-744, Korea

Department of Energy System Engineering (Nuclear Engineering), Seoul National University



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