Double Layer-Relevant Laboratory Results

2007.12.31 14:48

최명선 조회 수:3794

연도 1992 
저널명 IEEE Transactions On Plasma Science 
 

Many double-layer-relevant laboratory experiments have been carried out at the University of Wisconsin. Laboratory stair-step double layers, which resemble three or more weak double layers joined in series, have been produced without ionization. Double-layer floating potential fluctuations have been investigated and progress has been made in developing a novel technique for measuring electron energy distribution functions in low-density double layers (i.e. λD≫probe dimensions). A new inductive plasma source has been developed. With this source, magnetized double layers can be routinely produced. These magnetized double layers are often weak stair-step double layers that are oblique to the magnetic field. Laboratory data of emitting probe characteristics taken in tenuous plasmas have helped to quantify space-charge-enhanced plasma gradient induced error in double-layer electric field measurements made by satellite double probes. Also, magnetic sheaths have been experimentally studied and compared with theory


10.1109/27.199499

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4633
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3794
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4087
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5393
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4612
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5303
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6963
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4667
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

Archives


XE Login