연도 1993 
저널명 Journal of Vacuum Science & Technology 

Emissive probe measurements of plasma potentials outside the source aperture of an electron cyclotron resonance etching device have shown large radial electric fields in a nitrogen discharge. It is shown that the magnitude of the radial electric field is pressure dependent, decreasing for higher pressures. In addition to radial and axial profiles of the plasma potential, profiles of ion density, electron temperature, and floating potential were measured with Langmuir probes for several cases: Two magnetic‐field configurations, with and without an insulating liner in the source, and with and without a wafer stage. It is shown that the plasma potential with the liner present is higher when there is a resonance zone close to the aperture of the source, as opposed to when the resonance zone is farther inside the source.


http://dx.doi.org/10.1116/1.578546 
 

연도 저널명 제목 조회 수
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16369
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 83221
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4870
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5324
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6003
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7298
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4662
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7625
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6958
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5309
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5964
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4075
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4601
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5293

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