연도 1995 
저널명 Physics of Plasmas 
 

The effects of both magnetic field and collisions on presheath properties are experimentally
 investigated in plasmas with electron temperatures much greater than ion temperatures.
 Measurements of plasma potential in collisionless plasmas show presheath thicknesses at
 boundaries oblique to magnetic field to be approximately (C,lw,;)sin I+$ where C, is the ion sound
 speed, wci is the ion gyrofrequency, and ‘4’ is the angle between the magnetic field and the normal
 to the wall boundary. Measurements of plasma potential in collisional plasmas find presheaths
 consisting of two distinctive regions. With ion-neutral collision mean-free path A,<( C,/w,i)sin ~4,
 the presheath region next to the sheath has collisional characteristics and a thickness of
 approximately (0.5 - 0.6)h, . The corresponding presheath region adjacent to the bulk plasma has
 magnetic characteristics and a thickness of approximately (0.5 - 0.9) (C,lW,i) sin $. Equipotential
 contours in the collisional region of this presheath are found to be parallel to the boundary, while
 those in the magnetic region are not.

 

http://dx.doi.org/10.1063/1.871153

연도 저널명 제목 조회 수
2002  Journal of Applied Physics  Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time 103730
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 83224
2012  JOURNAL OF APPLIED PHYSICS  Fabrication of single-walled carbon nanohorns containing iodine and cesium 41166
2018  IEEE Transactions on Semiconductor Manufacturing  Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables 28205
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16371
2015  Journal of Physics D: Applied Physics  How to determine the relative ion concentrations of multiple-ion-species plasmas generated in the multi-dipole filament source 12026
2014  Applied Science and Convergence Technology  Monitoring Ion Energy Distribution in Capacitively Coupled Plasmas Using Non-invasive Radio-Frequency Voltage Measurements 10672
2009  Journal of Korean Physical Society  Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge 10078
    유도 결합형 Ar/CH4 플라즈마를 이용한 ITO의 식각 특성에 관한 연구 file 9923
2001  Surface & Coating Technology  Measurement of sheath expansion in plasma source ion implantation 9761
2012  PLASMA SOURCES SCIENCE AND TECHNOLOGY  Characteristics of vapor coverage formation on an RF-driven metal electrode to discharge a plasma in saline solution 9616
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8539
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8453
2010  Thin Solid Films  Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition 8222

Archives


XE Login