연도 1998 
저널명 Physics of Plasmas 
 

The mode transition from a capacitively coupled mode (E mode) to an inductively coupled mode (H mode) was observed in an inductive Ar plasma source by applying an axially uniform low B field. The applied fundamental rf was 13.56 MHz and many harmonic components were observed. A beat and standing wave patterns of azimuthally symmetric (m = 0 mode) first and second harmonic pseudosurfaces and helicon waves were measured at various densities (n ∼ 9.0×1010–2.2×1011 cm−3) and B fields (12–28 G). Wave propagation mode changes, from pseudosurface to helicon waves and from helicon to pseudosurface waves, were observed at critical conditions, ωc/ω>3.0 and n ∼ 2.2×1011 cm−3. © 1998 American Institute of Physics.


http://dx.doi.org/10.1063/1.873040

연도 저널명 제목 조회 수
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2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6820
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6958
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7059
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7184
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7298
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7306
2011  IEEE TRANSACTIONS ON PLASMA SCIENCE  Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge 7399
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2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8537

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