연도 1998 
저널명 Physics of Plasmas 
 

The mode transition from a capacitively coupled mode (E mode) to an inductively coupled mode (H mode) was observed in an inductive Ar plasma source by applying an axially uniform low B field. The applied fundamental rf was 13.56 MHz and many harmonic components were observed. A beat and standing wave patterns of azimuthally symmetric (m = 0 mode) first and second harmonic pseudosurfaces and helicon waves were measured at various densities (n ∼ 9.0×1010–2.2×1011 cm−3) and B fields (12–28 G). Wave propagation mode changes, from pseudosurface to helicon waves and from helicon to pseudosurface waves, were observed at critical conditions, ωc/ω>3.0 and n ∼ 2.2×1011 cm−3. © 1998 American Institute of Physics.


http://dx.doi.org/10.1063/1.873040

연도 저널명 제목 조회 수
2019  Plasma Processes and Polymers  Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing 1317
2015  Journal of Nuclear Materials  Recrystallization of Bulk and Plasma-Coated Tungsten with Accumulated Thermal Energy Relevant to Type-I ELM in ITER H-Mode Operation 1246
2015  IEEE TRANSACTIONS ON PLASMA SCIENCE  Bullet Velocity Distribution of a Helium Atmospheric-Pressure Plasma Jet in Various N2/O2 Mixed Ambient Conditions 1220
2017  Physics of Plasmas  Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure 1181
2014  IEEE TRANSACTIONS ON PLASMA SCIENCE  Characteristics of OH* Generation in Pin-to-Electrolyte Discharges 1140
2016  Metals and Materials International  High-Temperature Thermo-Mechanical Behavior of Functionally Graded Materials Produced by Plasma Sprayed Coating: Experimental and Modeling Results 1122
2019  Journal of Periodontal & Implant Science  The bactericidal effect of an atmospheric-pressure plasma jet on Porphyromonas gingivalis biofilms on sandblasted and acid-etched titanium discs 1119
2019  Plasma Physics and Controlled Fusion  Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing 1116
2019  반도체디스플레이기술학회지  플라즈마 정보인자를 활용한 SiO2 식각 깊이 가상 계측 모델의 특성 인자 역할 분석 1107
2015  Physics of Plasmas  Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions 1028
2016  Journal of the Korean Physical Society  Observation of Oversaturation-Induced Defect Formation in Tungsten Irradiated by Low Energy Deuterium Ion 949
2019  Scientific Reports  Quantitation of the ROS production in plasma and radiation treatments of biotargets 945
2015  Fusion Science and Technology  Laser-Assisted Ha Spectroscopy for Measurement of Negative Ion Density in A Hydrogen Plasma 940
2014  Journal of Nuclear Materials  Investigation of SOL plasma interaction with graphite PFC 908
2015  Journal of Nuclear Materials  Investigation of SOL plasma interaction with graphite PFC 877

Archives


XE Login