| 2000 | Applied physics letters |
Influence of Electrode-Size Effects on Plasma Sheath Expansion
| 7306 |
| 2001 | Journal of applied physics |
Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma
| 5657 |
| 2001 | IEEE Transactions On Plasma Science |
Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas
| 4189 |
| 2001 | Japanese journal of applied physics |
Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
| 4942 |
| 2001 | Surface & Coating Technology |
The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation
| 7063 |
| 2001 | Surface & Coating Technology |
Measurement of sheath expansion in plasma source ion implantation
| 9767 |
| 2001 | Journal of the Korean Physical Society |
Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma
| 16380 |
| 2001 | Current Applied Physics |
Calculation of transport parameters in KT-1 tokamak edge plasma
| 83234 |
| 2002 | Surface and Coatings Technology |
The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation
| 5369 |
| 2002 | Journal of Applied Physics |
Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time
| 103800 |
| 2004 | Plasma Science, IEEE Transactions on |
Analysis of Langmuir Probe Data Using Wavelet Transform
| 4138 |
| 2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6277 |
| 2004 | Surface and Coatings Technology |
Time-resolved plasma measurement in a high-power pulsed ICP source for large area
| 4512 |
| 2006 | Transactions on Electrical and Electronic Materials |
SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge
| 6052 |
| 2006 | Contributions to Plasma Physics |
In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source
| 7190 |
