2019 | Current Applied Physics |
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
| 645 |
2019 | IAEA CRP report |
Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling
| 610 |
2019 | Journal of Periodontal & Implant Science |
The bactericidal effect of an atmospheric-pressure plasma jet on Porphyromonas gingivalis biofilms on sandblasted and acid-etched titanium discs
| 1119 |
2019 | 반도체디스플레이기술학회지 |
플라즈마 정보인자를 활용한 SiO2 식각 깊이 가상 계측 모델의 특성 인자 역할 분석
| 1109 |
2019 | 반도체디스플레이기술학회지 |
할로겐 플라즈마에 의한 Ge2Sb2Te5 식각 데미지 연구
| 6852 |
2019 | Scientific Reports |
Quantitation of the ROS production in plasma and radiation treatments of biotargets
| 948 |
2020 | Physics of Plasmas |
Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM
| 3805 |
2021 | Materials |
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
| 1679 |
2021 | Atoms |
Population Kinetics Modeling of Low-Temperature Argon Plasma
| 696 |
2021 | Journal of the Korean Physical Society |
Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma
| 333 |
2021 | Current Applied Physics |
Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate
| 456 |
2021 | 반도체디스플레이기술학회지 |
VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석
| 862 |
2022 | Journal of Alloys and Compounds |
Competitive roles of dislocations on blister formation in polycrystalline pure tungsten
| 457 |
2022 | Physics of Plasma |
2022 Review of Data-Driven Plasma Science
| 839 |
2022 | Plasma Sources Science and Technology |
Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma
| 440 |