연도 1999 
저널명 Journal of aerosol science 

Journal of aerosol science.||1999||30(S1)||||s419||420||K.H. Ahn, T.W. Kang, G.H. Kim, and H.I. Yang

연도 저널명 제목 조회 수
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6114
2006  Transactions on Electrical and Electronic Materials  SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 6052
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6026
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
    3-5mm 강판절단용 아크 플라즈마 절단기 팁 개발 file 5929
2009  Journal of Applied Physics  Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge 5767
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5706
2001  Journal of applied physics  Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma 5657
2016  Fusion Engineering and Design  Deuterium ion irradiation induced blister formation and destruction 5572
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5393
2002  Surface and Coatings Technology  The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation 5369
2012  Fusion Engineering and Design  Influence of H+ ion irradiation on the surface and microstructural changes of a nuclear graphite 5363
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320

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