연도 1999 
저널명 Physics of Plasma 
 

Properties of the ion sheath expansion in plasma are investigated for atarget voltage with a finite rise time. A theoretical model for ionsheath expansion is developed when the negative target voltage increases linearly. The theory predicts that the sheath expansion is proportional to the square root of time at the beginning and is proportional to the 56 power of time later on. An experimental measurement has been carried out and the measured data are compared with theoretical results. It is shown that the sheath front propagates very fast at the beginning and slows down later, even for continuously rising negative voltage ontarget.


http://dx.doi.org/10.1063/1.873673

연도 저널명 제목 조회 수
2002  Journal of Applied Physics  Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time 103609
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 83194
2012  JOURNAL OF APPLIED PHYSICS  Fabrication of single-walled carbon nanohorns containing iodine and cesium 37603
2018  IEEE Transactions on Semiconductor Manufacturing  Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables 28201
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16347
2015  Journal of Physics D: Applied Physics  How to determine the relative ion concentrations of multiple-ion-species plasmas generated in the multi-dipole filament source 12021
2014  Applied Science and Convergence Technology  Monitoring Ion Energy Distribution in Capacitively Coupled Plasmas Using Non-invasive Radio-Frequency Voltage Measurements 10644
2009  Journal of Korean Physical Society  Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge 10075
    유도 결합형 Ar/CH4 플라즈마를 이용한 ITO의 식각 특성에 관한 연구 file 9914
2001  Surface & Coating Technology  Measurement of sheath expansion in plasma source ion implantation 9760
2012  PLASMA SOURCES SCIENCE AND TECHNOLOGY  Characteristics of vapor coverage formation on an RF-driven metal electrode to discharge a plasma in saline solution 9616
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8536
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8453
    플라즈마 이온주입 방법에 의한 질화철 제조 및 자기적 성질 file 8221

Archives


XE Login