연도  
저널명  
 
Journal of the Korean Vacuum Society ||1999||8(3)||||361||367||김곤호, 김영우, 김건우, 한승희, 홍문표||||It w as observed mat the time--dependent sheath w hich was f ormed around the pIanar tû get
biased by negatively voItage pulse w i th a f inite rise time in the pIasma source ion implantation. Resul ts
show that the time-dependent sheath consisted of two pû ts: the ion man ix sheath deveIOPInent during
the pulse r ise time and the dynamic sheath motion af ter attaini ng the hl Il puIse. T he ion matrix sheath
deveIOPInent which is in propor tion to square root of the pulse time and the pulse r ise rate over the
plasma densi ty but independent of me i on mass- The dynamic sheath propag ates with approximately me
ion sound speed.

연도 저널명 제목 조회 수
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3780
2015  Current Applied Physics  Determination of electron energy probability function in low-temperature plasmas from current - voltage characteristics of two Langmuir probes filtered by Savitzky-Golay and Blackman window methods 3788
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3789
2017  Journal of Physics D: Applied Physics  Optical Diagnostics for Highly-populated Tail of Electron Energy Distribution Function in Very-High-Frequency Capacitively Coupled Plasma Using Spin- and Dipole-forbidden Lines 3845
2014  Fusion Engineering and Design  Preliminary test results on tungsten tile with castellation structures in KSTAR 3914
    Characteristics of Microwave Air Plasma With a Wide Range of Operating Pressures file 3997
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4076
2004  Plasma Science, IEEE Transactions on  Analysis of Langmuir Probe Data Using Wavelet Transform 4135
2013  Thin Solid Films  Field-emission performance and structural change mechanism of multiwalled carbon nanotubes by oxygen plasma treatment 4172
2001  IEEE Transactions On Plasma Science  Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas 4185
2015  IEEE TRANSACTIONS ON Semiconductor Manufacturing  Enhancement of the Virtual Metrology Performance for Plasma-assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters 4190
    Determination of Plasma Potential from the Langmuir Probe Trace Using Bi-orthogonal Wavelet Transform file 4229
    유한오름시간을 갖는 음전위 펄스에서 시변환 플라즈마 덮개의 거동연구 file 4286
2006  Japanese Journal of Applied Physics  Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions 4305
    The operation properties of DBD reactors in air pressure with varying the capacitance of reactors file 4457

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