연도 2000 
저널명 REVIEW OF SCIENTIFIC INSTRUMENTS 
 

New features of the emissive probe characteristic curves in an inductive plasma source were observed in the E mode operation. More than the two inflection points in the derivative of the I–V characteristic curves are found when the harmonics of the input frequency (13.56 MHz) are present. The pairs of inflection points are symmetric about dc plasma potential. © 2000 American Institute of Physics.


http://dx.doi.org/10.1063/1.1150214

연도 저널명 제목 조회 수
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1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5392
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4612
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5302
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6963
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4667
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2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

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