연도 2000 
저널명 Plasma sources science & technology 
 

The Omegatron mass spectrometer, originally developed for measuring atomic constants, was employed for measuring both positive ions and negative ions in high density, electron cyclotron resonance etching plasmas. The main disadvantages of the conventional design of the Omegatron include the observation of resonance frequency shifts and poor mass resolution in a relatively weak magnetic field. Based on 2D numerical analysis, several modifications were carried out to overcome these limitations: the (±) ion collector, differential pumping, different RF excitation methods, an additional magnet for uniform magnetic field, etc. Experimental results indicated the presence of H− and H−2 in H2 plasmas, and F− and CF− in CF4 plasmas.


https://doi.org/10.1088/0963-0252/9/2/302
 

연도 저널명 제목 조회 수
2014  Applied Science and Convergence Technology  Monitoring Ion Energy Distribution in Capacitively Coupled Plasmas Using Non-invasive Radio-Frequency Voltage Measurements 10710
2014  IEEE TRANSACTIONS ON PLASMA SCIENCE  Characteristics of OH* Generation in Pin-to-Electrolyte Discharges 1142
2014  Journal of Nuclear Materials  Investigation of SOL plasma interaction with graphite PFC 909
2014  반도체디스플레이기술학회지  좁은 간격 CCP 전원의 전극과 측면 벽 사이 플라즈마 분포 1729
2015  J. Phys. D: Appl. Phys.  Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method 3285
2015  Physics of Plasmas  Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions 1028
2015  Journal of Physics D: Applied Physics  How to determine the relative ion concentrations of multiple-ion-species plasmas generated in the multi-dipole filament source 12038
2015  IEEE TRANSACTIONS ON PLASMA SCIENCE  Bullet Velocity Distribution of a Helium Atmospheric-Pressure Plasma Jet in Various N2/O2 Mixed Ambient Conditions 1220
2015  IEEE TRANSACTIONS ON Semiconductor Manufacturing  Enhancement of the Virtual Metrology Performance for Plasma-assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters 4199
2015  Fusion Science and Technology  Characterization of Two–Radiofrequency–Driven Dual Antenna Negative Hydrogen Ion Sources 1375
2015  Journal of Nuclear Materials  Investigation of SOL plasma interaction with graphite PFC 877
2015  Fusion Science and Technology  Laser-Assisted Ha Spectroscopy for Measurement of Negative Ion Density in A Hydrogen Plasma 940
2015  Fusion Science and Technology  Analysis on Interface Diffusion-Induced Embrittlement Between Tungsten and Graphite with Reactive Diffusion Barrier Model 2241
2015  Journal of Nuclear Materials  Recrystallization of Bulk and Plasma-Coated Tungsten with Accumulated Thermal Energy Relevant to Type-I ELM in ITER H-Mode Operation 1247
2015  Current Applied Physics  Determination of electron energy probability function in low-temperature plasmas from current - voltage characteristics of two Langmuir probes filtered by Savitzky-Golay and Blackman window methods 3798

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