연도 2000 
저널명 Plasma sources science & technology 
 

The Omegatron mass spectrometer, originally developed for measuring atomic constants, was employed for measuring both positive ions and negative ions in high density, electron cyclotron resonance etching plasmas. The main disadvantages of the conventional design of the Omegatron include the observation of resonance frequency shifts and poor mass resolution in a relatively weak magnetic field. Based on 2D numerical analysis, several modifications were carried out to overcome these limitations: the (±) ion collector, differential pumping, different RF excitation methods, an additional magnet for uniform magnetic field, etc. Experimental results indicated the presence of H− and H−2 in H2 plasmas, and F− and CF− in CF4 plasmas.


https://doi.org/10.1088/0963-0252/9/2/302
 

연도 저널명 제목 조회 수
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16368
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 83221
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4870
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5324
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6003
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7298
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4662
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7625
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6958
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5309
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5964
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4075
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4601
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5293

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