연도 2000 
저널명 Applied physics letters 
 

Influence of the electrode-size effects on plasma sheath expansion is investigated for a negative voltage at the cathode with maximum amplitude of V0, assuming that the cathode is a thin, flat, conducting, circular disk of radius R. It is shown that propagation of the sheath front is proportional to the one-third power of the combination, 2V0R/π. Experimental measurements have been carried out to verify theoretical predictions. The experimental data agree remarkably well with theoretical results in every aspect. © 2000 American Institute of Physics.


ttp://dx.doi.org/10.1063/1.1311318

연도 저널명 제목 조회 수
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7307
2001  Journal of applied physics  Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma 5657
2001  IEEE Transactions On Plasma Science  Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas 4189
2001  Japanese journal of applied physics  Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate 4942
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7063
2001  Surface & Coating Technology  Measurement of sheath expansion in plasma source ion implantation 9767
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16381
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 83234
2002  Surface and Coatings Technology  The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation 5369
2002  Journal of Applied Physics  Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time 103800
2004  Plasma Science, IEEE Transactions on  Analysis of Langmuir Probe Data Using Wavelet Transform 4138
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6277
2004  Surface and Coatings Technology  Time-resolved plasma measurement in a high-power pulsed ICP source for large area 4512
2006  Transactions on Electrical and Electronic Materials  SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 6052
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7190

Archives


XE Login