2013 | Journal of Thermal Spray Technology |
Effect of Helmholtz Oscillation on Auto-shroud for APS Tungsten Carbide Coating
| 3361 |
1993 | Journal of Vacuum Science & Technology |
Role of contaminants in electron cyclotron resonance plasmas
| 5393 |
1993 | Journal of Vacuum Science & Technology |
Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device
| 4612 |
1993 | Journal of Vacuum Science & Technology |
Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma
| 5303 |
2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6408 |
2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6278 |
2021 | Materials |
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
| 1679 |
2016 | Metals and Materials International |
High-Temperature Thermo-Mechanical Behavior of Functionally Graded Materials Produced by Plasma Sprayed Coating: Experimental and Modeling Results
| 1124 |
2017 | Nuclear Fusion |
Enhancement of deuterium retention in damaged tungsten by plasma induced defect clustering
| 3531 |
1999 | Physics of Plasma |
Ion sheath expansion for a target voltage with a finite risetime
| 8619 |
2022 | Physics of Plasma |
2022 Review of Data-Driven Plasma Science
| 839 |
1995 | Physics of Plasmas |
Magnetic and Collisional Effects on Presheaths
| 5973 |
1998 | Physics of Plasmas |
Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field
| 7634 |
2007 | Physics of Plasmas |
Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation
| 5189 |
2015 | Physics of Plasmas |
Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions
| 1028 |