연도 2001 
저널명 Surface & Coating Technology 
 

In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a planar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse. (i) An ion-matrix sheath expansion scaled with the square root of pulse rise rate and the supersonic velocity during the pulse rise-time. (ii) A sheath expanding with the order of the ion sound speed in the flat-top phase of the pulse. And finally, (iii) sheath shrinking in the fall-time of the pulse. It was also observed that the ion wave was propagated into the plasma after the flat-top phase of the pulse.


https://doi.org/10.1016/S0257-8972(00)01035-5

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4633
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3794
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4087
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5393
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4612
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5303
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6963
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4667
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

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