In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source

2008.11.07 13:57

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연도 2006 
저널명 Contributions to Plasma Physics 
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The in-situ monitoring method of plasma density variation in the inductively coupled plasma (ICP) source was developed with the air-core transformer model using the current and voltage of antenna. The model was modified for the ICP generated by the flat antenna. The collision effect was also considered to obtain the skin depth and plasma impedance. Monitored plasma density was compared to the probe data taken at the center of chamber, showing the good agreement in the density variation with various powers of 100 to 1500 W and the argon operating pressures of 7 to 100 mTorr, respectively. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)


10.1002/ctpp.200610021

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