연도 2006 
저널명 한국진공학회지 

한국진공학회||2006||15||3||246||258||정경재, 최재명, 황휘동, 김곤호, 고광철, 황용석||한국||

 

음의 고전압의 인가에 따라 반응하는 동적 플라즈마를 부하로 갖는 PSII(plasma source ion implantation) 펄스 시스템을 분석하기 위한 회로 모델을 개발하였다. 플라즈마 내에 삽입된 평판 전극 앞에서의 플라즈마 쉬스의 움직임은 동적 차일드-랑뮤어 쉬스 모델을 따르는 것으로 가정하였다. 표적 전극에 흐르는 전류는 전극에 인가되는 전압과 서로 영향을 주며 변하므로 동적 플라즈마 부하를 전압 의존 전류 원으로 표현하여 자기모순이 없는 회로 모델을 구현하였다. 회로 해석은 Pspice 프로그램을 이용하여 수행하였으며, 다양한 플라즈마 조건과 펄스인가 조건에서의 실험 결과와 비교하여 회로 모델의 타당성을 검증하였다.

A circuit model has been developed to analyze characteristics of the PSII(plasma source ion implantation) pulse system with dynamic plasma load. The plasma sheath in front of the immersed planar target biased with a negative-high voltage pulse is assumed to be governed by the dynamic Child-Langmuir sheath model. Target current is self-consistently varied with the applied voltage by using the voltage-controlled current source in the circuit model. Circuit simulations are conducted with Pspice circuit simulator, and simulated pulse currents and voltages on the target are compared and confirmed with experimental results for various voltage pulses and plasma conditions.



 

연도 저널명 제목 조회 수
2006  Japanese Journal of Applied Physics  Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions 4317
2006  Japanese Journal of Applied Physics  Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma 4555
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6538
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7308
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5704
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8454
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5188
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6112
2009  Journal of Applied Physics  Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge 5760
2009  Journal of Korean Physical Society  Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge 10088
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6024
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8551
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6400
2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6837
2010  Thin Solid Films  Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition 8235

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