연도 2009 
저널명 Journal of the Korean Physical Society 
 

A new algorithm to analyze the digitized Langmuir probe (LP) data is developed with the wavelet transforms, providing the electron energy distribution function (EEDF) for bi-Maxwellian plasmas. Because most of algorithms to analyze the probe data have been developed with the Druyvesteyn formula which is based on the second derivation of current with respect to probe voltage, the accuracy of analysis is very sensitive to the noise level during the derivation of probe data. Especially the amount of hot electrons in the bi-Maxwellian plasma is small enough to compare the noise level and the noise filtering method is a kernel in the development of the algorithm to analyze the bi-Maxwellian EEDF. Here, the bi-orthogonal wavelet and continuous wavelet transforms are chosen for the de-noising and the differentiation processes respectively. It has an advantage to provide the filtered data with minimum loss of important information. The artificial LP data sets composed of electrons were generated with various bulk and hot temperatures and the developed algorithm was evaluated for the various white noise levels. For the case that the noise levels are 10 times of ion saturation current, the plasma parameters such as the population of hot electrons and the temperatures of hot and bulk electron were accurately analyzed within only a few percent deviations from the input values for the generation of artificial probe data. As the demonstration of the algorithm, the analysis of probe data was carried out for the DC glow and the inductively coupled plasmas (ICP) with various input powers and operating pressures, respectively. From the EEDF analyses of those plasmas, the variation of hot electrons in the DC plasma and the Ramsauer effect of low pressure ICP could be observed clearly.


 10.3938/jkps.55.1825

연도 저널명 제목 조회 수
2017  Physics of Plasmas  Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure 1194
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3840
2019  Plasma Physics and Controlled Fusion  Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing 1119
2019  Plasma Processes and Polymers  Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing 1326
2004  Plasma Science, IEEE Transactions on  Analysis of Langmuir Probe Data Using Wavelet Transform 4149
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4633
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878
2012  PLASMA SOURCES SCIENCE AND TECHNOLOGY  Characteristics of vapor coverage formation on an RF-driven metal electrode to discharge a plasma in saline solution 9622
2017  Plasma Sources Science and Technology  Ion-neutral collision effect on ion-ion two-stream-instability near sheath-presheath boundary in two-ion-species plasmas 3432
2022  Plasma Sources Science and Technology  Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma file 451
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4087
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6114
2016  Science of Advanced Materials  Characteristics of Molybdenum as a Plasma-Generating Electrode 1884

Archives


XE Login