연도 2010 
저널명 Thin Solid Films 
 

Plasma polymer coatings were deposited from hexamethyldisiloxane on polyethylene terephthalate (PET) substrates while varying the operating conditions, such as the Ar and O2 flow rates, at a fixed radio frequency power of 300 W. The water vapor transmission rate (WVTR) of the untreated PET was 54.56 g/m2/day and was decreased after depositing the silicon oxide (SiOx) coatings. The minimum WVTR, 0.47 g/m2/day, was observed at Ar and O2 flow rates of 4 and 20 sccm, respectively, with a coating thickness of 415.44 nm. The intensity of the peaks for the Si-O-Si bending at 800-820 cm- 1 and Si-O-Si stretching at 1000-1150 cm- 1 varied depending on the Ar and O2 flow rates. The contact angle of the SiOx coated PET increased as the Ar flow rate was increased from 2 to 8 sccm at a fixed O2 flow rate of 20 sccm. It decreased gradually as the oxygen flow rate increased from 12 to 28 sccm at a fixed Ar carrier gas flow rate. The examination by atomic force microscopy revealed a correlation of the SiOx morphology and the water vapor barrier performance with the Ar and O2 flow rates. The roughness of the deposited coatings increased when either the O2 or Ar flow rate was increased.


https://doi.org/10.1016/j.tsf.2009.07.147

연도 저널명 제목 조회 수
2006  Japanese Journal of Applied Physics  Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions 4317
2006  Japanese Journal of Applied Physics  Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma 4555
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6538
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7308
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5704
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8454
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5188
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6112
2009  Journal of Applied Physics  Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge 5760
2009  Journal of Korean Physical Society  Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge 10088
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6024
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8551
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6400
2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6837
2010  Thin Solid Films  Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition 8235

Archives


XE Login