연도 2012 
저널명 PLASMA SOURCES SCIENCE AND TECHNOLOGY 
 

Abstract - The generation condition of sub-mm sized non-thermal plasmas (named aqua-plasmas) inside electrically conductive liquids (saline) is investigated with various electrical conductivities of the electrolyte. The breakdown condition of an RF-driven (380 kHz and less than 50 W) aqua-plasma discharge on a metal electrode is investigated using both experimental and numerical simulation methods. Since breakdown occurs in the vapor covering the powered electrode surface, the boiling process and the influence of fluidic dynamics on the vapor coverage oscillation are considered in detail. The vapor coverage is formed on the metal electrode surface via three phases: individual bubble generation, merging of bubbles and maintaining the bubbles during the aqua-plasma discharge inside the full vapor coverage. The surface temperature is evaluated from a numerical simulation based on the proposed one-dimensional aqua-plasma equivalent circuit electro-fluid power balance, and the bubble coverage can be sustained due to boiling of the film on the heated electrode by a current flow of electrolyte ions, especially Na+ in this case. The periodic discharge of the aqua-plasma inside the shrunken vapor coverage is investigated by a model that considers the electrolyte viscosity and surface charge model. The vapor coverage periodically shrinks under the heat balance between the gain, mainly plasma heating and heat flux from the heated tip, and the loss to the saline, so it is a feature that the aqua-plasma is discharged during the period of shrinkage. Moreover, the tip, heated up to meet the temperature condition of film boiling ∼ 300 ◦C, reduces the breakdown field due to the reduced work function of the electrode material.


https://doi.org/10.1088/0963-0252/21/5/055017

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4632
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3787
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4086
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5391
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4610
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5300
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5972
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6962
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4664
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6009
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5331
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

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