Experimental investigation of plasma recovery during the pulse-off time in plasma source ion implantation
2013.10.28 16:55
연도 | 2013 |
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저널명 | Thin Solid Film |
쪽 |
Abstract - Experimental results pertaining to the plasma recovery process during the pulse-off time in plasma source
ion implantation are presented. A series of experiments conducted in low-pressure argon plasma with various
pulse voltages and pulse-on times reveals that the plasma recovery time is almost linearly proportional to
the sheath thickness at the switch-off time. However, for sheaths larger than several centimeters, the plasma
recovery times are observed to be shorter than those predicted by a simple theoretical model, expressed as
5 s/uB where uB and s are the Bohm speed and the sheath thickness at the switch-off time, respectively.
The reduction of plasma recovery time is found to be the consequence of realistic plasma parameters such
as non-uniform density and ion drift velocity distributions in front of a target, which were not considered
in the theoretical model.