연도 2013 
저널명 Thin Solid Film 
 

Abstract - Experimental results pertaining to the plasma recovery process during the pulse-off time in plasma source

ion implantation are presented. A series of experiments conducted in low-pressure argon plasma with various

pulse voltages and pulse-on times reveals that the plasma recovery time is almost linearly proportional to

the sheath thickness at the switch-off time. However, for sheaths larger than several centimeters, the plasma

recovery times are observed to be shorter than those predicted by a simple theoretical model, expressed as

5 s/uB where uB and s are the Bohm speed and the sheath thickness at the switch-off time, respectively.

The reduction of plasma recovery time is found to be the consequence of realistic plasma parameters such

as non-uniform density and ion drift velocity distributions in front of a target, which were not considered

in the theoretical model.


https://doi.org/10.1016/j.tsf.2013.05.073

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4630
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3780
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4075
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5385
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4601
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5290
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5309
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5964
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6958
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7625
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4650
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6002
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5324
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4869

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