연도 2011 
저널명 전기전자재료학회논문지 
 

Abstract: The conducting current of non-uniform plasma immersed electrode consists of ion current and secondary electron emission current caused by the impinging ion current. The ion current is determined by the ion dose passing through the sheath in front of electrode and the ion distribution in front of the electrode plays an important role in the secondary electron emission. The investigation of the distributed plasma and secondary electron effect on electrode ion current was carried out as the stainless steel electrode plugged with quartz tube was immersed in the inductively coupled Ar plasma using the antenna powered by 1 kw and the density profile was measured. After that, the negative voltage was applied by 1 kV∼6 kV to measure the conduction current for the analysis of ion current.


10.4313/JKEM.2011.24.6.504

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4633
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3794
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4087
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5393
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4612
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5303
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5321
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6963
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4667
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

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