연도 2015 
저널명 Physics of Plasmas 
 
Abstract

A global model was developed to investigate the densities of negative ions and the other species in
a low-pressure inductively coupled hydrogen plasma with a bi-Maxwellian electron energy
distribution. Compared to a Maxwellian plasma, bi-Maxwellian plasmas have higher populations
of low-energy electrons and highly vibrationally excited hydrogen molecules that are generated
efficiently by high-energy electrons. This leads to a higher reaction rate of the dissociative electron
attachment responsible for negative ion production. The model indicated that the bi-Maxwellian
electron energy distribution at low pressures is favorable for the creation of negative ions. In addition,
the electron temperature, electron density, and negative ion density calculated using the model
were compared with the experimental data. In the low-pressure regime, the model results of the bi-
Maxwellian electron energy distributions agreed well quantitatively with the experimental measurements,
unlike those of the assumed Maxwellian electron energy distributions that had discrepancies.

연도 저널명 제목 조회 수
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5697
2006  Transactions on Electrical and Electronic Materials  SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 6051
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6536
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7184
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7306
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8453
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5176
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6104
2009  Journal of Applied Physics  Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge 5747
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6004
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6389
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8539
2009  Journal of Korean Physical Society  Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge 10078
2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6820
2010  Thin Solid Films  Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition 8222

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