연도 2015 
저널명 Physics of Plasmas 
 
Abstract

A global model was developed to investigate the densities of negative ions and the other species in
a low-pressure inductively coupled hydrogen plasma with a bi-Maxwellian electron energy
distribution. Compared to a Maxwellian plasma, bi-Maxwellian plasmas have higher populations
of low-energy electrons and highly vibrationally excited hydrogen molecules that are generated
efficiently by high-energy electrons. This leads to a higher reaction rate of the dissociative electron
attachment responsible for negative ion production. The model indicated that the bi-Maxwellian
electron energy distribution at low pressures is favorable for the creation of negative ions. In addition,
the electron temperature, electron density, and negative ion density calculated using the model
were compared with the experimental data. In the low-pressure regime, the model results of the bi-
Maxwellian electron energy distributions agreed well quantitatively with the experimental measurements,
unlike those of the assumed Maxwellian electron energy distributions that had discrepancies.

연도 저널명 제목 조회 수
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2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6833
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1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6962
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7063
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7190
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7306
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7308
2011  IEEE TRANSACTIONS ON PLASMA SCIENCE  Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge 7431
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1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
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2010  Thin Solid Films  Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition 8234
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8454
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8550

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