연도 2015 
저널명 Journal of Physics D: Applied Physics 
 

Abstract
This paper introduces how to determine concentrations of ion species in a mixed gas plasma that are not linearly proportional to their neutral partial pressures. A particle balance model was developed to predict the relative ion concentrations in multiple-ion-species plasmas, considering their ionization rates and loss fluxes to the wall. Analysis is carried out especially with Ar/Xe and Ar/He multi-dipole plasmas in which the neutral gases are directly ionized by the mono-energetic primary electrons. The experimental data of ion concentrations were obtained using the ion acoustic wave measurement method of the concentration of two ion species. The comparison reveals that the ion concentration ratio is linearly proportional to the ratio of the ionization cross sections and the ion loss velocity between two gas species. Especially, the model prediction is improved with using the two-ion-species sheath model (recently reported by Baalrud and Hegna) for obtaining the ion loss velocity at the sheath
boundary.


Keywords: ion concentration, two-ion-species multi-dipole plasma, Ar/Xe, Ar/He, generalized bohm criterion


http://dx.doi.org/10.1088/0022-3727/48/22/225201

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4632
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3794
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4087
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5392
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4612
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5302
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6963
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4667
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

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