연도 2015 
저널명 Fusion Science and Technology 
 

Abstract


 The characteristics of a two–radio-frequency (RF)–driven dual antenna inductively coupled hydrogen plasma is investigated for the development of a high efficient RF negative hydrogen ion source driver. The two-RF-driven dual antenna system consists of a 2 MHz–driven solenoidal antenna wound around a cylindrical chamber and a 13.56 MHz–driven planar antenna placed on top of it. Compared to the conventional single frequency antenna inductively coupled plasmas, the two-RF-driven dual antenna inductively coupled plasma reveals two distinctive features, i.e., an increase in the power transfer efficiency and the bi-Maxwellization of the electron energy distribution function due to the collisionless heating. These characteristics allow the two-RF-driven dual antenna inductively coupled plasma to accomplish enhanced generation of negative ions and their precursors with a high RF efficiency.


dx.doi.org/10.13182/FST14-892

연도 저널명 제목 조회 수
    플라즈마 이온주입 방법에 의한 질화철 제조 및 자기적 성질 file 8224
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7706
    플라즈마내 입자의 하전 특성에 관한 연구 file 7509
2011  IEEE TRANSACTIONS ON PLASMA SCIENCE  Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge 7508
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7373
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7330
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7212
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7091
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6989
2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6883
2019  반도체디스플레이기술학회지  할로겐 플라즈마에 의한 Ge2Sb2Te5 식각 데미지 연구 6874
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6542
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6515
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6390
2014  Journal of Physics D: Applied Physics  Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna 6279

Archives


XE Login