연도 2015 
저널명 Journal of Nuclear Materials 
 

Abstract


Morphological changes of graphite plasma facing component (PFC) were investigated with various ion irradiation conditions which may change the sputtering yield and the scrape-off layer (SOL) plasma property. The experiments were carried out by using electron cyclotron resonance deuterium plasma with the conditions of electron density range of 2.5–3.5 × 1011 cm−3, electron temperature range of 3.3–4.1 eV, and ion energy range of 17–100 eV. The graphite morphology was changed from plane to conical tip with increasing ion energy and dose. In addition, morphological changes increase the sputtering yield due to the increase of local angle of ion incidence. The inflow of hydrocarbon causes the increase of electron density and the decrease of electron temperature due to its higher dissociation and ionization rates than those of deuterium. This result suggests that the morphological changes of graphite should be considered in the SOL plasma interaction with graphite PFC.


https://doi.org/10.1016/j.jnucmat.2014.10.087

연도 저널명 제목 조회 수
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5698
2006  Transactions on Electrical and Electronic Materials  SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 6051
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6536
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7184
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7306
2006  한국진공학회지  PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발 8453
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5181
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6110
2009  Journal of Applied Physics  Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge 5753
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6014
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6393
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8544
2009  Journal of Korean Physical Society  Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge 10085
2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6825
2010  Thin Solid Films  Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition 8226

Archives


XE Login