연도 2016 
저널명 반도체디스플레이기술학회지 
 
Abstract: The Townsend to glow discharge mode transition was investigated in the dielectric barrier discharge (DBD) helium
plasma source which was powered by 20 kHz / 4.5 kVrms high voltage at atmospheric pressure. The spatial profile of
the electric field strength at each modes was measured by using the intensity ratio method of two helium emission lines
(667.8 nm (31D → 21P) and 728.1 nm (31S → 21P)) and the Stark effect. ICCD images were analyzed with consideration
for the electric field property. The Townsend discharge (TD) mode at the initial stage of breakdown has the light emission
region located in the vicinity of the anode. The electric field of the light emitting region is close to the applied field in
the system. Immediately, the light emitting region moves to the cathode and the discharge transits to the glow discharge
(GD) mode. This mode transition can be understood with the ionization wave propagation. The electric field of the emitting
region of GD near cathode is higher than that of TD near anode because of the cathode fall formation. This observation
may apply to designing a DBD process system and to analysis of the process treatment results.
연도 저널명 제목 조회 수
    정전 탐침을 이용한 유도 결합형 반응기에서 발생하는 산소 플라즈마의 특성연구 file 4481
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2006  Japanese Journal of Applied Physics  Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma 4555
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1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4632
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4667
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878
2012  Journal of the Korean Physical Society  Field Emission Characteristics of Cone-shaped Carbon-nanotube Bundles Fabricated Using an Oxygen Plasma 4940
2001  Japanese journal of applied physics  Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate 4943
2013  Journal of Applied Physics  Low-energy D+ and H+ ion irradiation effects on highly oriented pyrolytic graphite 5000
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5189
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5302
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5332
2012  Fusion Engineering and Design  Influence of H+ ion irradiation on the surface and microstructural changes of a nuclear graphite 5363

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