연도 2017 
저널명 Physics of Plasmas 
 

This study investigated the transition of the plasma shape from a ring-shaped bullet to a pin-like streamer adjacent to the electrolyte surface in a kHz-driven helium atmospheric pressure plasma jet. The transition was observed by synchronized fast images, plasma propagation speed, time-resolved emission profile of Hb, and spatially and temporally resolved helium metastable density. The transition height increased when electrolyte evaporation was enhanced. The plasma continued to discharge on the electrolyte surface even in the absence of metastable species, i.e., the discharge mechanism changed from Penning ionization between helium metastable and ambient nitrogen to electron collision on evaporated water.


http://dx.doi.org/10.1063/1.4974263

연도 저널명 제목 조회 수
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2015  Fusion Science and Technology  Laser-Assisted Ha Spectroscopy for Measurement of Negative Ion Density in A Hydrogen Plasma 940
2015  Fusion Science and Technology  Analysis on Interface Diffusion-Induced Embrittlement Between Tungsten and Graphite with Reactive Diffusion Barrier Model 2240
2019  IAEA CRP report  Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling 606
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3787
2001  IEEE Transactions On Plasma Science  Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas 4189
2011  IEEE TRANSACTIONS ON PLASMA SCIENCE  Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge 7431
2014  IEEE TRANSACTIONS ON PLASMA SCIENCE  Characteristics of OH* Generation in Pin-to-Electrolyte Discharges 1140
2015  IEEE TRANSACTIONS ON PLASMA SCIENCE  Bullet Velocity Distribution of a Helium Atmospheric-Pressure Plasma Jet in Various N2/O2 Mixed Ambient Conditions 1220
2015  IEEE TRANSACTIONS ON Semiconductor Manufacturing  Enhancement of the Virtual Metrology Performance for Plasma-assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters 4199
2018  IEEE Transactions on Semiconductor Manufacturing  Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables 28211
2017  International Journal of Refractory Metals & Hard Materials  Fabrication of sintered tungsten by spark plasma sintering and investigation of thermal stability 2972
2016  International Journal of Refractory Metals and Hard Materials  Improvement of mechanical property of air plasma sprayed tungsten film using pulsed electric current treatment 3191
2015  J. Phys. D: Appl. Phys.  Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method 3284
2001  Japanese journal of applied physics  Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate 4942

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