Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing

2019.07.24 10:45

pal_webmaster 조회 수:1321

연도 2019 
저널명 Plasma Processes and Polymers 
쪽 - 

Plasma Processes and Polymers


Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing


주저자: Seolhye Park


S. Park, PPAP, 2019


https://doi.org/10.1002/ppap.201900030

이 게시물을
목록
목록
연도 저널명 제목 조회 수
2013  Journal of Thermal Spray Technology  Effect of Helmholtz Oscillation on Auto-shroud for APS Tungsten Carbide Coating 3361
2015  J. Phys. D: Appl. Phys.  Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method 3285
2016  International Journal of Refractory Metals and Hard Materials  Improvement of mechanical property of air plasma sprayed tungsten film using pulsed electric current treatment 3191
2013  Thin Solid Film  Experimental investigation of plasma recovery during the pulse-off time in plasma source ion implantation 3150
2017  International Journal of Refractory Metals & Hard Materials  Fabrication of sintered tungsten by spark plasma sintering and investigation of thermal stability 2973
2011  전기전자재료학회논문지  플라즈마 삽입전극의 전류에 미치는 밀도 구배의 영향 2781
2013  Current Applied Physics  Driving frequency dependency of gas species in the bubble formation for aqua plasma generation 2310
2015  Fusion Science and Technology  Analysis on Interface Diffusion-Induced Embrittlement Between Tungsten and Graphite with Reactive Diffusion Barrier Model 2241
2014  Journal of the Korean Physical Society  Characteristics of a Non-Maxwellian Electron Energy Distribution in a Low-pressure Argon Plasma 1916
2016  Science of Advanced Materials  Characteristics of Molybdenum as a Plasma-Generating Electrode 1883
2016  Journal of the Korean Physical Society  Effects of Metastable Species in Helium and Argon Atmospheric Pressure Plasma Jets (APPJs) on Inactivation of Periodontopathogenic Bacteria 1817
2014  반도체디스플레이기술학회지  좁은 간격 CCP 전원의 전극과 측면 벽 사이 플라즈마 분포 1729
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1679
2014  반도체디스플레이기술학회지  이중 주파수 전원의 용량성 결합 플라즈마 식각장비에서 전극하전에 의한 입사이온 에너지분포 변화연구 1461
2015  Fusion Science and Technology  Characterization of Two–Radiofrequency–Driven Dual Antenna Negative Hydrogen Ion Sources 1375
쓰기...
태그

Archives

XE Login