연도 2019 
저널명 Journal of Periodontal & Implant Science 
49(5):319-329 

https://doi.org/10.5051/jpis.2019.49.5.319


제목 : The bactericidal effect of an atmospheric-pressure plasma jet on Porphyromonas gingivalis biofilms on sandblasted and acid-etched titanium discs

주저자 : Ji-Yoon Lee 

연도 저널명 제목 조회 수
2001  IEEE Transactions On Plasma Science  Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas 4214
2011  IEEE TRANSACTIONS ON PLASMA SCIENCE  Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge 7508
2019  IAEA CRP report  Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling 614
2015  Fusion Science and Technology  Laser-Assisted Ha Spectroscopy for Measurement of Negative Ion Density in A Hydrogen Plasma 991
2015  Fusion Science and Technology  Characterization of Two–Radiofrequency–Driven Dual Antenna Negative Hydrogen Ion Sources 1460
2015  Fusion Science and Technology  Analysis on Interface Diffusion-Induced Embrittlement Between Tungsten and Graphite with Reactive Diffusion Barrier Model 2311
2024  Fusion Engineering and Design  Sputtering yield increase with fluence in low-energy argon plasma-tungsten interaction file 146
2014  Fusion Engineering and Design  Preliminary test results on tungsten tile with castellation structures in KSTAR 4012
2012  Fusion Engineering and Design  Influence of H+ ion irradiation on the surface and microstructural changes of a nuclear graphite 5436
2016  Fusion Engineering and Design  Deuterium ion irradiation induced blister formation and destruction 5716
2024  Current Applied Physics  Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate 356
2022  Current Applied Physics  Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma 474
2021  Current Applied Physics  Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate 500
2019  Current Applied Physics  Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth 670
2013  Current Applied Physics  Driving frequency dependency of gas species in the bubble formation for aqua plasma generation 2382

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