연도 2020 
저널명 Physics of Plasmas 

Physics of Plasmas

 
Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM
 
주저자: Seolhye Park
 
Park, Seolhye, et al., Physics of Plasmas 27.8 (2020): 083507.
 
연도 저널명 제목 조회 수
2013  Journal of Thermal Spray Technology  Effect of Helmholtz Oscillation on Auto-shroud for APS Tungsten Carbide Coating 3360
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5391
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4610
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5300
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6400
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6277
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1672
2016  Metals and Materials International  High-Temperature Thermo-Mechanical Behavior of Functionally Graded Materials Produced by Plasma Sprayed Coating: Experimental and Modeling Results 1122
2017  Nuclear Fusion  Enhancement of deuterium retention in damaged tungsten by plasma induced defect clustering 3530
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2022  Physics of Plasma  2022 Review of Data-Driven Plasma Science file 832
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5972
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5188
2015  Physics of Plasmas  Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions 1028

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