doi : 추가예정 (accepted)

Authors : Sangwon Ryu, Ji-Won Kwon, Ingyu Lee, Jihoon Park and Gon-Ho Kim

Abstract : 

A phenomenology-based model predictive controller (MPC) that controls electron density as desired set-point in Ar/SF6 capacitively coupled etch plasma was developed. In the development of the controller, the control model was established based on the power balance model and the dynamic characteristics of the equipment. The performance of the controller is evaluated through set-point tracking test. It was experimentally shown that the MPC showed better performance compared to proportional integral derivative (PID) controller. It is expected that this will be an element technology of an automated process controller that keep the process plasma in desired condition.