연도 2022 
저널명 Physics of Plasma 

doi : 

 

Authors : Rushil Anirudh, Rick Archibald, M. Salman Asif, Markus M. Becker, Sadruddin Benkadda, Peer-Timo Bremer, Rick H.S. Budé, C.S. Chang, Lei Chen, R. M. Churchill, Jonathan Citrin, Jim A Gaffney, Ana Gainaru, Walter Gekelman, Tom Gibbs, Satoshi Hamaguchi, Christian Hill, Kelli Humbird, Sören Jalas, Satoru Kawaguchi, Gon-Ho Kim, Manuel Kirchen, Scott Klasky, John L. Kline, Karl Krushelnick, Bogdan Kustowski, Giovanni Lapenta, Wenting Li, Tammy Ma, Nigel J. Mason, Ali Mesbah, Craig Michoski, Todd Munson, Izumi Murakami, Habib N. Najm, K. Erik J. Olofsson, Seolhye Park, J. Luc Peterson, Michael Probst, Dave Pugmire, Brian Sammuli, Kapil Sawlani, Alexander Scheinker, David P. Schissel, Rob J. Shalloo, Jun Shinagawa, Jaegu Seong, Brian K. Spears, Jonathan Tennyson, Jayaraman Thiagarajan, Catalin M. Ticoş, Jan Trieschmann, Jan van Dijk, Brian Van Essen, Peter Ventzek, Haimin Wang, Jason T. L. Wang, Zhehui Wang, Kristian Wende, Xueqiao Xu, Hiroshi Yamada, Tatsuya Yokoyama, Xinhua Zhang

 

Abstract : 

Data science and technology offer transformative tools and methods to science. This review article highlights latest development and progress in the interdisciplinary field of data-driven plasma science (DDPS). A large amount of data and machine learning algorithms go hand in hand. Most plasma data, whether experimental, observational or computational, are generated or collected by machines today. It is now becoming impractical for humans to analyze all the data manually. Therefore, it is imperative to train machines to analyze and interpret (eventually) such data as intelligently as humans but far more efficiently in quantity. Despite the recent impressive progress in applications of data science to plasma science and technology, the emerging field of DDPS is still in its infancy. Fueled by some of the most challenging problems such as fusion energy, plasma processing of materials, and fundamental understanding of the universe through observable plasma phenomena, it is expected that DDPS continues to benefit significantly from the interdisciplinary marriage between plasma science and data science into the foreseeable future.

연도 저널명 제목 조회 수
2019  Plasma Physics and Controlled Fusion  Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing 1114
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2017  Physics of Plasmas  Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure 1180
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3789
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5176
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5965
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7625
2022  Physics of Plasma  2022 Review of Data-Driven Plasma Science file 817
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
2017  Nuclear Fusion  Enhancement of deuterium retention in damaged tungsten by plasma induced defect clustering 3525
2016  Metals and Materials International  High-Temperature Thermo-Mechanical Behavior of Functionally Graded Materials Produced by Plasma Sprayed Coating: Experimental and Modeling Results 1120
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1661
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6274
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4601
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5293

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