연도 2022 
저널명 Plasma Sources Science and Technology 

DOI : 추가 예정 (accept)

 

Authors : Haneul Lee, Nam-Kyun Kim, Myeong-Geon Lee, Ji-Won Kwon, Sung Hyun Son, Namjae Bae, Taejun Park, Seolhye Park and Gon-Ho Kim

 

Abstract :

The effects of ion collisions on plasma-sheath formation are investigated experimentally for a low-density and low-pressure discharge. The space potential and ion velocity distribution measurements at high spatial resolution show that the ion collision properties observed in the presheath are maintained in the plasma-sheath transition region. The potential drop in the transition region indicates the existence of ionization as an effect of ion collisions in the transition region owing to the non-negligible density of the electrons penetrating the sheath. Based on comparisons between the space potential measurements and Riemann's presheath-sheath transition solution, the ion collision length λ_i was determined as a key parameter in the presheath and transition region. And it represents that the thermal properties of ions and neutral gases affects space potential by the charge exchange and ionization collisions. The existence of the ion collision effect in the transition region suggests possible influence on the incident conditions of ions and electrons near the sheath edge. Consequently, the energy distributions of ions and electrons incident on the material surface facing the sheath are sensitive to the collisionality and operating conditions.

연도 저널명 제목 조회 수
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2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3867
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5358
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1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7706
2019  Plasma Physics and Controlled Fusion  Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing 1219
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1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4684
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4912
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2017  Plasma Sources Science and Technology  Ion-neutral collision effect on ion-ion two-stream-instability near sheath-presheath boundary in two-ion-species plasmas 3545
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