연도 2022 
저널명 Plasma Sources Science and Technology 

DOI : 추가 예정 (accept)

 

Authors : Haneul Lee, Nam-Kyun Kim, Myeong-Geon Lee, Ji-Won Kwon, Sung Hyun Son, Namjae Bae, Taejun Park, Seolhye Park and Gon-Ho Kim

 

Abstract :

The effects of ion collisions on plasma-sheath formation are investigated experimentally for a low-density and low-pressure discharge. The space potential and ion velocity distribution measurements at high spatial resolution show that the ion collision properties observed in the presheath are maintained in the plasma-sheath transition region. The potential drop in the transition region indicates the existence of ionization as an effect of ion collisions in the transition region owing to the non-negligible density of the electrons penetrating the sheath. Based on comparisons between the space potential measurements and Riemann's presheath-sheath transition solution, the ion collision length λ_i was determined as a key parameter in the presheath and transition region. And it represents that the thermal properties of ions and neutral gases affects space potential by the charge exchange and ionization collisions. The existence of the ion collision effect in the transition region suggests possible influence on the incident conditions of ions and electrons near the sheath edge. Consequently, the energy distributions of ions and electrons incident on the material surface facing the sheath are sensitive to the collisionality and operating conditions.

연도 저널명 제목 조회 수
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4632
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3787
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4085
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5391
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4610
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5300
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5320
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5972
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6962
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4664
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8619
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6009
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5331
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4878

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