연도 1995 
저널명 Physics of Plasmas 
 

The effects of both magnetic field and collisions on presheath properties are experimentally
 investigated in plasmas with electron temperatures much greater than ion temperatures.
 Measurements of plasma potential in collisionless plasmas show presheath thicknesses at
 boundaries oblique to magnetic field to be approximately (C,lw,;)sin I+$ where C, is the ion sound
 speed, wci is the ion gyrofrequency, and ‘4’ is the angle between the magnetic field and the normal
 to the wall boundary. Measurements of plasma potential in collisional plasmas find presheaths
 consisting of two distinctive regions. With ion-neutral collision mean-free path A,<( C,/w,i)sin ~4,
 the presheath region next to the sheath has collisional characteristics and a thickness of
 approximately (0.5 - 0.6)h, . The corresponding presheath region adjacent to the bulk plasma has
 magnetic characteristics and a thickness of approximately (0.5 - 0.9) (C,lW,i) sin $. Equipotential
 contours in the collisional region of this presheath are found to be parallel to the boundary, while
 those in the magnetic region are not.

 

http://dx.doi.org/10.1063/1.871153

연도 저널명 제목 조회 수
1992  IEEE Transactions On Plasma Science  Double Layer-Relevant Laboratory Results 3780
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4630
1993  Review of scientific instruments  Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe 4075
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4601
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5291
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5385
1995  Journal of applied physics  A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool 5309
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5964
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6958
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7625
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4650
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8615
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4869
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5324
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6002

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