| 2019 | Scientific Reports |
Quantitation of the ROS production in plasma and radiation treatments of biotargets
| 935 |
| 2016 | Journal of the Korean Physical Society |
Observation of Oversaturation-Induced Defect Formation in Tungsten Irradiated by Low Energy Deuterium Ion
| 947 |
| 2015 | Physics of Plasmas |
Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions
| 1006 |
| 2019 | 반도체디스플레이기술학회지 |
플라즈마 정보인자를 활용한 SiO2 식각 깊이 가상 계측 모델의 특성 인자 역할 분석
| 1106 |
| 2019 | Plasma Physics and Controlled Fusion |
Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing
| 1113 |
| 2019 | Journal of Periodontal & Implant Science |
The bactericidal effect of an atmospheric-pressure plasma jet on Porphyromonas gingivalis biofilms on sandblasted and acid-etched titanium discs
| 1115 |
| 2016 | Metals and Materials International |
High-Temperature Thermo-Mechanical Behavior of Functionally Graded Materials Produced by Plasma Sprayed Coating: Experimental and Modeling Results
| 1120 |
| 2014 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Characteristics of OH* Generation in Pin-to-Electrolyte Discharges
| 1138 |
| 2017 | Physics of Plasmas |
Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure
| 1180 |
| 2015 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Bullet Velocity Distribution of a Helium Atmospheric-Pressure Plasma Jet in Various N2/O2 Mixed Ambient Conditions
| 1210 |
| 2015 | Journal of Nuclear Materials |
Recrystallization of Bulk and Plasma-Coated Tungsten with Accumulated Thermal Energy Relevant to Type-I ELM in ITER H-Mode Operation
| 1240 |
| 2019 | Plasma Processes and Polymers |
Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing
| 1311 |
| 2015 | Fusion Science and Technology |
Characterization of Two–Radiofrequency–Driven Dual Antenna Negative Hydrogen Ion Sources
| 1360 |
| 2014 | 반도체디스플레이기술학회지 |
이중 주파수 전원의 용량성 결합 플라즈마 식각장비에서 전극하전에 의한 입사이온 에너지분포 변화연구
| 1458 |
| 2021 | Materials |
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
| 1661 |
