1992 | IEEE Transactions On Plasma Science |
Double Layer-Relevant Laboratory Results
| 3780 |
2015 | Current Applied Physics |
Determination of electron energy probability function in low-temperature plasmas from current - voltage characteristics of two Langmuir probes filtered by Savitzky-Golay and Blackman window methods
| 3788 |
2020 | Physics of Plasmas |
Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM
| 3789 |
2017 | Journal of Physics D: Applied Physics |
Optical Diagnostics for Highly-populated Tail of Electron Energy Distribution Function in Very-High-Frequency Capacitively Coupled Plasma Using Spin- and Dipole-forbidden Lines
| 3845 |
2014 | Fusion Engineering and Design |
Preliminary test results on tungsten tile with castellation structures in KSTAR
| 3914 |
| |
Characteristics of Microwave Air Plasma With a Wide Range of Operating Pressures
| 3997 |
1993 | Review of scientific instruments |
Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe
| 4076 |
2004 | Plasma Science, IEEE Transactions on |
Analysis of Langmuir Probe Data Using Wavelet Transform
| 4135 |
2013 | Thin Solid Films |
Field-emission performance and structural change mechanism of multiwalled carbon nanotubes by oxygen plasma treatment
| 4172 |
2001 | IEEE Transactions On Plasma Science |
Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas
| 4185 |
2015 | IEEE TRANSACTIONS ON Semiconductor Manufacturing |
Enhancement of the Virtual Metrology Performance for Plasma-assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters
| 4190 |
| |
Determination of Plasma Potential from the Langmuir Probe Trace Using Bi-orthogonal Wavelet Transform
| 4229 |
| |
유한오름시간을 갖는 음전위 펄스에서 시변환 플라즈마 덮개의 거동연구
| 4286 |
2006 | Japanese Journal of Applied Physics |
Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions
| 4305 |
| |
The operation properties of DBD reactors in air pressure with varying the capacitance of reactors
| 4457 |