| 2013 | Journal of Thermal Spray Technology |
Effect of Helmholtz Oscillation on Auto-shroud for APS Tungsten Carbide Coating
| 3353 |
| 1993 | Journal of Vacuum Science & Technology |
Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device
| 4601 |
| 1993 | Journal of Vacuum Science & Technology |
Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma
| 5293 |
| 1993 | Journal of Vacuum Science & Technology |
Role of contaminants in electron cyclotron resonance plasmas
| 5386 |
| 2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6389 |
| 2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6274 |
| 2021 | Materials |
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
| 1661 |
| 2016 | Metals and Materials International |
High-Temperature Thermo-Mechanical Behavior of Functionally Graded Materials Produced by Plasma Sprayed Coating: Experimental and Modeling Results
| 1120 |
| 2017 | Nuclear Fusion |
Enhancement of deuterium retention in damaged tungsten by plasma induced defect clustering
| 3525 |
| 2022 | Physics of Plasma |
2022 Review of Data-Driven Plasma Science
 | 817 |
| 1999 | Physics of Plasma |
Ion sheath expansion for a target voltage with a finite risetime
| 8615 |
| 2015 | Physics of Plasmas |
Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions
| 1007 |
| 2017 | Physics of Plasmas |
Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure
| 1180 |
| 2020 | Physics of Plasmas |
Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM
| 3789 |
| 2007 | Physics of Plasmas |
Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation
| 5176 |
