연도 저널명 제목 조회 수
2014  Journal of the Korean Physical Society  Characteristics of a Non-Maxwellian Electron Energy Distribution in a Low-pressure Argon Plasma 1908
2014  Fusion Engineering and Design  Preliminary test results on tungsten tile with castellation structures in KSTAR 3914
2014  Journal of Physics D: Applied Physics  Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna 6220
2014  Applied Science and Convergence Technology  Monitoring Ion Energy Distribution in Capacitively Coupled Plasmas Using Non-invasive Radio-Frequency Voltage Measurements 10696
2015  Journal of Nuclear Materials  Investigation of SOL plasma interaction with graphite PFC 865
2015  Fusion Science and Technology  Laser-Assisted Ha Spectroscopy for Measurement of Negative Ion Density in A Hydrogen Plasma 935
2015  Physics of Plasmas  Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions 1007
2015  IEEE TRANSACTIONS ON PLASMA SCIENCE  Bullet Velocity Distribution of a Helium Atmospheric-Pressure Plasma Jet in Various N2/O2 Mixed Ambient Conditions 1210
2015  Journal of Nuclear Materials  Recrystallization of Bulk and Plasma-Coated Tungsten with Accumulated Thermal Energy Relevant to Type-I ELM in ITER H-Mode Operation 1240
2015  Fusion Science and Technology  Characterization of Two–Radiofrequency–Driven Dual Antenna Negative Hydrogen Ion Sources 1360
2015  Fusion Science and Technology  Analysis on Interface Diffusion-Induced Embrittlement Between Tungsten and Graphite with Reactive Diffusion Barrier Model 2230
2015  J. Phys. D: Appl. Phys.  Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method 3275
2015  Current Applied Physics  Determination of electron energy probability function in low-temperature plasmas from current - voltage characteristics of two Langmuir probes filtered by Savitzky-Golay and Blackman window methods 3788
2015  IEEE TRANSACTIONS ON Semiconductor Manufacturing  Enhancement of the Virtual Metrology Performance for Plasma-assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters 4190
2015  Journal of Physics D: Applied Physics  How to determine the relative ion concentrations of multiple-ion-species plasmas generated in the multi-dipole filament source 12026

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